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VPDBOX for gas-phase decomposition

 

VPDBOX for gas-phase decomposition Feature

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VPD BOX
●It is a device that takes the oxide film and the nitride film on the silicon wafer apart in the vapor phase by using natural evaporation of the fluorinated acid liquid, and puts the surface of the wafer into the state of the canal.

●The part in Liquid of acid and the acid atmosphere touched uses PTFE and PVDF.

●Please use it together with semiautomatic collection device SC series.

 
 

VPDBOX for gas-phase decomposition Specification

 
  200-1M 300-1M 300-5M 300-6M
The number of sheets of the maximum processing 1枚 5枚 6枚
Size of correspondence wafer
100mm
125mm
150mm
200mm
300mm -
Externals (W×D×H) (mm) 270×300×130 370×400×130 400×400×510
Service space In Clean draft
External resource N2 gas (for acid atmosphere purge)
 
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