NAS Giken, Inc.

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PRODUCTS

Automated Recovery System of Nano Contaminants (NAC Series)

Automated Recovery System of Nano Contaminants
(NAC Series)

NAC-302 NAC-304 NAC-316
About NAC Series
Obtained International Patent for bevel recovery.
The world's top-class function and technology in collecting hydrophilic surface.

● High-efficiency equipment to perform following process on silicon wafers by automatically;
VPD Process -> Scanning wafer surface and sampling contaminants -> Dilution of sampling solution

● An extremely effective device when it is necessary to take a sample from a large number of wafers at one time and analyze it.

● Sampling nano metal contamination from surface and sides (bevel parts) of silicon wafers.

● Able to collect contamination of both hydrophobic and hydrophilic wafer surfaces.
* Please note that bevel parts are when hydrophobic wafers only.

● Can process bulk etching.

● Uniformity / Flatness of wafers after etching process is within 10%.

● A function of measuring and diluting the sampling solution, and prevents the work from continuing with the
solution remaining on the wafer.

● Double door prevents the acid atmosphere in devices from mixing with contaminants on the operator.

● Automatically clean the liquid holder used for sampling. It will lead to saving time of operators
(Compatible with both normal and bevel holders).

There has been a significantly high need for the device that performs all following process automatically in these days
for the purpose of reducing contamination (Applicable by NAC-316);
Bulk etching -> Sampling contaminations -> ICP-MS connection & elemental analysis


Device Name NAC-302 NAC-304 NAC-316
Wafer Size 125mm,150mm,
200mm,300mm
125mm,150mm,
200mm,300mm
300mm
Operation PC
Bulk Etching Function
ICP-MS Auto Connection
Automatic Preparation of
ICP-MS Calibration Curve
Load Port
Basic Sampling Pattern Ring-shaped, Fixed Radius, Side (Bevel)
Size (W×D×H) (*1) 1300×1200×2000(mm) 1800×1350×2000(mm) 1600×2700×2000(mm)
Equipment used Acid drainage,General exhaust,Acid exhaust
Recommended
Environment
Inside Clean Draft
Utilities N2, CDA, DIW,
AC-100V 15A,
AcidDrain&Exhaust,
General Exhaust
O2, N2, CDA, DIW, AC-100V 15A,
Acid Drain & Exhaust, General Exhaust
※1: Does not include protrusions.

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Call to speak to us 9:00-17:00
(Monday to Friday)

Tel. +81-42-557-5207

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